N-Iru SiC lori Si Composite Substrates Dia6inch
等级Ipele | U | P级 | D级 |
Iwọn BPD kekere | Ipele iṣelọpọ | Idiwon ite | |
直径Iwọn opin | 150,0 mm ± 0.25mm | ||
厚度Sisanra | 500 μm± 25μm | ||
晶片方向Wafer Iṣalaye | Pa axis: 4.0° si <11-20> ± 0.5°fun 4H-N Lori ipo: <0001>±0.5°fun 4H-SI | ||
主定位边方向Alapin akọkọ | {10-10}±5.0° | ||
主定位边长度Primary Flat Gigun | 47,5 mm ± 2,5 mm | ||
边缘Iyasoto eti | 3 mm | ||
总厚度变化/弯曲度/翘曲度 TTV/ Teriba / Warp | ≤15μm /≤40μm /≤60μm | ||
微管密度和基面位错MPD&BPD | MPD≤1 cm-2 | MPD≤5 cm-2 | MPD≤15 cm-2 |
BPD≤1000cm-2 | |||
电阻率Resistivity | ≥1E5 Ω·cm | ||
表面粗糙度Irora | Polish Ra≤1 nm | ||
CMP Ra≤0.5 nm | |||
裂纹(强光灯观测) # | Ko si | Ipari akojo ≤10mm, ipari kan≤2mm | |
Awọn dojuijako nipasẹ ina kikankikan giga | |||
六方空洞(强光灯观测)* | Agbegbe akojọpọ ≤1% | Agbegbe akojọpọ ≤5% | |
Hex Plates nipasẹ ina kikankikan giga | |||
多型(强光灯观测)* | Ko si | Agbegbe akojọpọ≤5% | |
Awọn agbegbe Polytype nipasẹ ina kikankikan giga | |||
划痕(强光灯观测)*& | 3 scratches to 1× wafer opin | 5 scratches to 1× wafer opin | |
Scratches nipasẹ ina kikankikan giga | akojo ipari | akojo ipari | |
崩边# Chip eti | Ko si | 5 laaye, ≤1 mm kọọkan | |
表面污染物(强光灯观测) | Ko si | ||
Idoti nipasẹ ina kikankikan giga |