N-Iru SiC lori Si Composite Substrates Dia6inch

Apejuwe kukuru:

N-Iru SiC lori awọn sobusitireti akojọpọ Si jẹ awọn ohun elo semikondokito ti o ni Layer ti n-Iru silikoni carbide (SiC) ti a fi silẹ sori sobusitireti ohun alumọni (Si).


Alaye ọja

ọja Tags

等级Ipele

U

P级

D级

Iwọn BPD kekere

Ipele iṣelọpọ

Idiwon ite

直径Iwọn opin

150,0 mm ± 0.25mm

厚度Sisanra

500 μm± 25μm

晶片方向Wafer Iṣalaye

Pa axis: 4.0° si <11-20> ± 0.5°fun 4H-N Lori ipo: <0001>±0.5°fun 4H-SI

主定位边方向Alapin akọkọ

{10-10}±5.0°

主定位边长度Primary Flat Gigun

47,5 mm ± 2,5 mm

边缘Iyasoto eti

3 mm

总厚度变化/弯曲度/翘曲度 TTV/ Teriba / Warp

≤15μm /≤40μm /≤60μm

微管密度和基面位错MPD&BPD

MPD≤1 cm-2

MPD≤5 cm-2

MPD≤15 cm-2

BPD≤1000cm-2

电阻率Resistivity

≥1E5 Ω·cm

表面粗糙度Irora

Polish Ra≤1 nm

CMP Ra≤0.5 nm

裂纹(强光灯观测) #

Ko si

Ipari akojo ≤10mm, ipari kan≤2mm

Awọn dojuijako nipasẹ ina kikankikan giga

六方空洞(强光灯观测)*

Agbegbe akojọpọ ≤1%

Agbegbe akojọpọ ≤5%

Hex Plates nipasẹ ina kikankikan giga

多型(强光灯观测)*

Ko si

Agbegbe akojọpọ≤5%

Awọn agbegbe Polytype nipasẹ ina kikankikan giga

划痕(强光灯观测)*&

3 scratches to 1× wafer opin

5 scratches to 1× wafer opin

Scratches nipasẹ ina kikankikan giga

akojo ipari

akojo ipari

崩边# Chip eti

Ko si

5 laaye, ≤1 mm kọọkan

表面污染物(强光灯观测)

Ko si

Idoti nipasẹ ina kikankikan giga

 

Alaye aworan atọka

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