Ohun elo Tinrin Wafer fun 4 Inch-12 Inch Sapphire/SiC/Si Wafers Ṣiṣe

Apejuwe kukuru:

Ohun elo Tinrin Wafer jẹ ohun elo to ṣe pataki ni iṣelọpọ semikondokito fun idinku sisanra wafer lati mu iṣakoso igbona pọ si, iṣẹ itanna, ati ṣiṣe iṣakojọpọ. Ohun elo yii nlo lilọ ẹrọ, ẹrọ didan kemikali (CMP), ati awọn imọ-ẹrọ etching gbigbẹ / tutu lati ṣaṣeyọri iṣakoso sisanra-kongẹ (± 0.1 μm) ati ibamu pẹlu awọn wafers 4-12-inch. Awọn ọna ṣiṣe wa ṣe atilẹyin iṣalaye ọkọ ofurufu C/A ati pe a ṣe deede fun awọn ohun elo ilọsiwaju bii 3D ICs, awọn ẹrọ agbara (IGBT/MOSFETs), ati awọn sensọ MEMS.

XKH n pese awọn solusan ni kikun, pẹlu ohun elo ti a ṣe adani (2-12-inch wafer processing), iṣapeye ilana (iwuwo abawọn <100/cm²), ati ikẹkọ imọ-ẹrọ.


Awọn ẹya ara ẹrọ

Ilana Ṣiṣẹ

Ilana tinrin wafer nṣiṣẹ nipasẹ awọn ipele mẹta:
Lilọ ti o ni inira: Kẹkẹ diamond kan (iwọn grit 200-500 μm) yọ 50-150 μm ti ohun elo kuro ni 3000-5000 rpm lati dinku sisanra ni kiakia.
Lilọ Didara: Kẹkẹ ti o dara julọ (iwọn grit 1–50 μm) dinku sisanra si 20–50 μm ni <1 μm/s lati dinku ibajẹ abẹlẹ.
Polishing (CMP): Atọka-kemikali-ẹrọ n yọkuro ibajẹ ti o ku, iyọrisi Ra <0.1 nm.

Awọn ohun elo ibaramu

Ohun alumọni (Si): Standard fun CMOS wafers, tinrin si 25 μm fun 3D akopọ.
Silicon Carbide (SiC): Nilo awọn kẹkẹ okuta iyebiye pataki (80% ifọkansi diamond) fun iduroṣinṣin gbona.
Sapphire (Al₂O₃): Tinrin si 50 μm fun awọn ohun elo LED UV.

Mojuto System irinše

1. Eto lilọ
Grinder-Axis Meji: Darapọ isokuso / lilọ ti o dara ni pẹpẹ kan, idinku akoko iyipo nipasẹ 40%.
Spindle Aerostatic: Iwọn iyara 0-6000 rpm pẹlu <0.5 μm radial runout.

2. Eto mimu Wafer
Chuck Vacuum:> 50 N dani agbara pẹlu deede ipo ipo ± 0.1 μm.
Apa Robotik: Gbigbe 4-12-inch wafers ni 100 mm/s.

3. Eto Iṣakoso
Interferometry lesa: Abojuto sisanra akoko gidi (ipinnu 0.01 μm).
Ifunni-iwakọ AI: Awọn asọtẹlẹ wiwọ kẹkẹ ati ṣatunṣe awọn ayeraye laifọwọyi.

4. Itutu & Cleaning
Ultrasonic Cleaning: Yọ awọn patikulu> 0.5 μm pẹlu ṣiṣe 99.9%.
Omi Deionized: Tutu wafer si <5°C loke ibaramu.

Awọn anfani pataki

1. Ultra-High Precision: TTV (Lapapọ Iyatọ Sisanra) <0.5 μm, WTW (Laarin-Wafer Iyatọ Sisanra) <1 μm.

2. Isopọpọ-ilana pupọ: Darapọ lilọ, CMP, ati etching pilasima ninu ẹrọ kan.

3. Ibamu Ohun elo:
Ohun alumọni: Idinku sisanra lati 775 μm si 25 μm.
SiC: Ṣe aṣeyọri <2 μm TTV fun awọn ohun elo RF.
Awọn Wafers Doped: Fọsifọọsi-doped InP wafers pẹlu <5% fiseete resistivity.

4. Automation Smart: Isopọpọ MES dinku aṣiṣe eniyan nipasẹ 70%.

5. Ṣiṣe Agbara: 30% agbara agbara kekere nipasẹ idaduro atunṣe.

Awọn ohun elo bọtini

1. Iṣakojọpọ ilọsiwaju
• Awọn ICs 3D: Tinrin Wafer jẹ ki iṣakojọpọ inaro ti ọgbọn / awọn eerun iranti (fun apẹẹrẹ, awọn akopọ HBM), iyọrisi bandiwidi giga giga 10 × ati 50% idinku agbara agbara ni akawe si awọn ojutu 2.5D. Ohun elo naa ṣe atilẹyin isọpọ arabara ati isọpọ TSV (Nipasẹ-Silicon Via), pataki fun awọn ilana AI / ML ti o nilo <10 μm interconnect pitch. Fun apẹẹrẹ, 12-inch wafers tinrin si 25 μm ngbanilaaye iṣakojọpọ awọn fẹlẹfẹlẹ 8+ lakoko ti o n ṣetọju <1.5% oju-iwe ogun, pataki fun awọn eto LiDAR adaṣe.

• Iṣakojọpọ Fan-Jade: Nipa didin sisanra wafer si 30 μm, ipari asopọ asopọ ti kuru nipasẹ 50%, idinku idaduro ifihan agbara (<0.2 ps/mm) ati mimuuṣe awọn chiplets 0.4 mm olekenka-tinrin fun awọn SoC alagbeka. Ilana naa n mu awọn algoridimu ti o ni isanpada wahala lati ṣe idiwọ oju-iwe ogun (> 50 μm TTV iṣakoso), ni idaniloju igbẹkẹle ninu awọn ohun elo RF igbohunsafẹfẹ giga.

2. Awọn ẹrọ itanna agbara
• Awọn Modulu IGBT: Tinrin si 50 μm dinku resistance igbona si <0.5 ° C / W, ṣiṣe awọn 1200V SiC MOSFETs lati ṣiṣẹ ni awọn iwọn 200 ° C junction. Ohun elo wa nlo lilọ-ipele pupọ (isọdi: 46 μm grit → itanran: 4 μm grit) lati yọkuro ibajẹ abẹlẹ, iyọrisi> awọn akoko 10,000 ti igbẹkẹle gigun kẹkẹ gbona. Eyi ṣe pataki fun awọn oluyipada EV, nibiti 10 μm-nipọn SiC wafers ṣe ilọsiwaju iyara iyipada nipasẹ 30% .
• Awọn ẹrọ Agbara GaN-on-SiC: Wafer tinrin si 80 μm nmu ilọsiwaju elekitironi pọ si (μ> 2000 cm²/V·s) fun 650V GaN HEMTs, idinku awọn adanu idari nipasẹ 18%. Ilana naa nlo dicing-iranlọwọ lesa lati ṣe idiwọ sisan lakoko tinrin, ṣiṣe iyọrisi <5 μm eti chipping fun awọn ampilifaya agbara RF.

3. Optoelectronics
• Awọn LED GaN-on-SiC: Awọn sobusitireti sapphire 50 μm ṣe ilọsiwaju imudara isediwon ina (LEE) si 85% (vs. 65% fun 150 μm wafers) nipa didindinku idẹkùn photon. Iṣakoso TTV ultra-kekere ti ohun elo wa (<0.3 μm) ṣe idaniloju itujade LED aṣọ kọja awọn wafers 12-inch, pataki fun awọn ifihan Micro-LED ti o nilo isokan gigun gigun <100nm.
• Silikoni Photonics: 25μm-nipọn silikoni wafers jeki 3 dB / cm kekere soju pipadanu ni waveguides, pataki fun 1.6 Tbps opitika transceivers. Ilana naa ṣopọ sisẹ CMP lati dinku aibikita dada si Ra <0.1 nm, imudara imudara idapọmọra nipasẹ 40%.

4. Awọn sensọ MEMS
• Accelerometers: 25 μm silicon wafers ṣe aṣeyọri SNR> 85 dB (vs. 75 dB fun 50 μm wafers) nipa jijẹ ifamọ iṣipopada ibi-ẹri. Eto lilọ-aksi meji wa sanpada fun awọn iwọn aapọn, ni idaniloju <0.5% fifo ifamọ lori -40°C si 125°C. Awọn ohun elo pẹlu wiwa jamba ọkọ ayọkẹlẹ ati ipasẹ išipopada AR/VR.

• Awọn sensọ Titẹ: Tinrin si 40 μm jẹ ki awọn sakani wiwọn 0-300 bar pẹlu <0.1% FS hysteresis. Lilo isunmọ igba diẹ (awọn gbigbe gilasi), ilana naa yago fun fifọ wafer lakoko etching ẹhin, ṣiṣe iyọrisi ifarada iwọn 1 μm fun awọn sensọ IoT ile-iṣẹ.

• Amuṣiṣẹpọ Imọ-ẹrọ: Awọn ohun elo tinrin wafer ṣe iṣọkan lilọ ẹrọ, CMP, ati pilasima etching lati koju awọn italaya ohun elo oniruuru (Si, SiC, Sapphire). Fun apẹẹrẹ, GaN-on-SiC nilo lilọ arabara (awọn kẹkẹ diamond + pilasima) lati ṣe iwọntunwọnsi líle ati imugboroosi gbona, lakoko ti awọn sensosi MEMS beere fun iha ilẹ-5 nm aibikita nipasẹ didan CMP.

• Ipa ile-iṣẹ: Nipa fifun awọn tinrin, awọn wafers ti o ga julọ, imọ-ẹrọ yii n ṣe awọn imotuntun ni awọn eerun AI, awọn modulu 5G mmWave, ati awọn ẹrọ itanna ti o rọ, pẹlu awọn ifarada TTV <0.1 μm fun awọn ifihan foldable ati <0.5 μm fun awọn sensọ LiDAR adaṣe.

Awọn iṣẹ XKH

1. Awọn solusan adani
Awọn atunto iwọn: Awọn apẹrẹ iyẹwu 4-12-inch pẹlu ikojọpọ adaṣe adaṣe.
Atilẹyin Doping: Awọn ilana aṣa fun awọn kirisita Er/Yb-doped ati awọn wafers InP/GaAs.

2. Ipari-si-Ipari Atilẹyin
Idagbasoke Ilana: Idanwo ọfẹ n ṣiṣẹ pẹlu iṣapeye.
Ikẹkọ Agbaye: Awọn idanileko imọ-ẹrọ lododun lori itọju ati laasigbotitusita.

3. Ṣiṣẹpọ Ohun elo lọpọlọpọ
SiC: Wafer tinrin si 100 μm pẹlu Ra <0.1 nm.
Sapphire: sisanra 50μm fun awọn ferese laser UV (gbigbe> 92% @ 200 nm).

4. Awọn iṣẹ afikun-iye
Ipese Lilo: Awọn kẹkẹ Diamond (2000+ wafers / igbesi aye) ati awọn slurries CMP.

Ipari

Ohun elo tinrin wafer yii n ṣe jiṣẹ deede ti ile-iṣẹ, iṣipopada ohun elo pupọ, ati adaṣe adaṣe, ti o jẹ ki o ṣe pataki fun isọpọ 3D ati ẹrọ itanna agbara. Awọn iṣẹ okeerẹ XKH - lati isọdi si iṣelọpọ lẹhin-ṣe rii daju pe awọn alabara ṣaṣeyọri ṣiṣe idiyele ati didara julọ iṣẹ ni iṣelọpọ semikondokito.

Ohun elo tinrin wafer 3
Awọn ohun elo tinrin wafer 4
Ohun elo tinrin wafer 5

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